Skip To Content Privacy Page

(303) 420-8242 | 7333 W. Jefferson Ave., Suite 235, Lakewood, CO 80235 USA

Back to News & Insights

Fundamentals of Industrial Hygiene in Semiconductor Manufacturing Presented by C&IH and Padre Consulting at SESHA 2026

Events | March 4, 2026

Events

Share

A Professional Development Course on the fundamentals of industrial hygiene in semiconductor manufacturing and other technology industries will be presented by C&IH and Padre Consulting at SESHA’s 48th Annual Symposium, held April 13–16, 2026, in Tempe, Arizona.

The course, Industrial Hygiene in the Semiconductor Industry: Key Hazards, Controls, and Best Practices, provides a focused introduction to industrial hygiene principles as applied in semiconductor research and production environments and other technology industries. Participants will review chemical and physical hazards commonly encountered across wafer fabrication, sub-fab operations, lithography, etch, deposition, ion implant, and chemical mechanical planarization (CMP) processes, as well as key physical hazards including noise, radiation, heat stress, and ergonomic risk.

The course will also address semiconductor-specific challenges such as cleanroom PPE considerations, engineering control verification, sub-fab exposure pathways, and risks associated with maintenance and non-routine work. Exposure assessment strategies, monitoring instrumentation, air and surface sampling approaches, and methods for evaluating engineering control performance will be reviewed.

Designed for environmental health and safety professionals with early to mid-career experience, the course provides practical support for hazard recognition, exposure evaluation, and risk-informed decision-making in complex semiconductor operations.

Course instructors include C&IH Director of Engineering Daniel Hall, Padre Consulting Services Managing Principal Steve Trammell, C&IH Exposure Modeling Engineer Cassidy Strode, C&IH Senior Scientist James Rasmuson, and C&IH Industrial Hygienist Noah Featherman.

Additional information about the symposium and technical program is available on the SESHA 2026 Annual Symposium Website.

You Might Also Enjoy

Laboratory Ventilation Risk Assessment and CFD Methods for Semiconductor Facilities Presented by C&IH and Padre Consulting at SESHA 2026

A technical session on laboratory ventilation risk assessment and Computational Fluid Dynamics (CFD) modeling will be presented by C&IH and Padre Consulting at SESHA’s 48th Annual Symposium, held April 13–16, 2026, in Tempe, Arizona. The presentation, Using Computational Fluid Dynamics to Assess and Optimize Laboratory Ventilation, will examine performance-based approaches to evaluating laboratory airflow and […]

Find out More

Elongate Mineral Particles Risk Assessment Workshop Presented by C&IH at ASBESTOS 2026 Conference

A technical session on risk assessment for elongate mineral particles (EMPs) will be presented by C&IH’s Dr. Andrey Korchevskiy at the ASBESTOS 2026 Conference in Sydney, Australia, held March 2-4, 2026. The session, Risk Assessment for Elongate Mineral Particles (EMPs): Scientific Findings and Practical Methodology, will address current frameworks for exposure assessment and risk characterization […]

Find out More

C&IH Study Reveals How Particle Size Influences Lung Retention of Elongate Mineral Particles

A new peer-reviewed article co-authored by C&IH scientists advances understanding of how the size (length and width) of elongate mineral particles affects their retention in the human lung and the implications for occupational-exposure risk assessment. The study, “Size-dependent retention of elongate mineral particles in human lungs: modeling and implications for risk assessment,” was published in […]

Find out More

C&IH provides national and international consulting from our office located near Denver, Colorado.

Contact Us

7333 W. Jefferson Ave., Suite 235

Lakewood, CO 80235

(303) 420-8242

Services

© 2026 Chemistry & Industrial Hygiene, Inc. All rights reserved.

Unless otherwise indicated, all materials on these pages are copyrighted by Chemistry & Industrial Hygiene. All rights reserved. No part of these pages, either text or image may be used for any purpose other than personal use. Therefore, reproduction, modification, storage in a retrieval system or retransmission, in any form or by any means, electronic, mechanical or otherwise, for reasons other than personal use, is strictly prohibited without prior written permission.